Patent · US Active

Multiple pattern generator integration with single post expose bake station

US7525646B1 · kind B1 · utility

3Cited by

6References

1Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Daniel Sullivan · Edina, US
Brain Neal Caldwell · Colchester, US
Adam C. Smith · Colchester, US
Jed H. Rankin · South Burlington, US

Key dates

Filing date	Mar 27, 2008
Grant date	Apr 28, 2009
Priority date	—
Expiry date	Mar 27, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70991
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A system and method of operation for a lithographic system having multiple exposure stations sharing one or more post-expose bake station and a centralized control system that schedules work through the expose station to the post-expose bake station while taking into consideration the patterning time for work pieces to be scheduled as well as the amount of post-expose delay allowable for the exposed work pieces.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.