Gas diffusion vacuum device
US7526917B1 · kind B1 · utility
Inventor
Key dates
| Filing date | Aug 11, 2008 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Aug 11, 2028 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04B37/02
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A gas diffusion vacuum device includes a supply of gas, a nonpermeable enclosure, a supply of liquid, an open liquid reservoir and a gas permeable cover. A first end of the nonpermeable enclosure is retained in the open liquid reservoir. The volume of gas is supplied through a side wall of the nonpermeable enclosure. The gas is preferably carbon dioxide. The gas permeable cover preferably includes a diffusion barrier and a porous diffusion barrier support. The diffusion barrier is wrapped over the porous diffusion barrier support and secured to a side wall of the nonpermeable enclosure. As the gas diffuses through the gas permeable cover, a vacuum is created to raise a column of liquid. A second embodiment of the gas diffusion vacuum device includes a supply of gas, a nonpermeable enclosure and a gas permeable cover. A vacuum created is used to perform work with an air driven device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.