Photoacid generators, photoresist composition including the same and method of forming pattern using the same
US7527913B2 · kind B2 · utility
4Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2008 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Jan 24, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a sulfonium-salt anionic group containing a carboxyl group as a hydrophilic site and a remainder of a solvent. The photoresist composition may form a photoresist pattern having a uniform profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.