Patent · US Active

Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate

US7528960B2 · kind B2 · utility

7Cited by

6References

15Claims

0Family size

Assignee

Vistec Semiconductor Systems GmbH · DE

Inventors

Artur Boesser · Breidenbach, DE
Andreas Schaaf · Mittenaar, DE

Key dates

Filing date	May 15, 2007
Grant date	May 5, 2009
Priority date	—
Expiry date	Jul 7, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG01B2290/70
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.