Optical system with nanoscale projection antireflection layer/embossing
US7529026B2 · kind B2 · utility
2Cited by
14References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2005 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Jan 10, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.