Droplet deposition position error measurement method, droplet deposition position error adjustment method, droplet ejection control method, and image forming apparatus
US7530660B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 26, 2006 |
| Grant date | May 12, 2009 |
| Priority date | — |
| Expiry date | Jun 11, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/2135
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The droplet deposition position error measurement method, comprises the steps of: ejecting liquid droplets from a liquid ejection head including a plurality of liquid droplet ejection ports in such a manner that the liquid droplets are deposited on a recording medium; determining an amount of a droplet deposition position error with respect to an ideal droplet deposition position on a recording surface of the recording medium, according to a droplet deposition result obtained from the liquid droplets on the recording medium; separating a first error component caused by an error in a relative position between the liquid ejection head and the recording medium, and a second error component caused by an error in an ejection direction of each of the liquid droplet ejection ports, from the determined amount of the droplet deposition position error; and obtaining error information relating to at least one of the first and second error components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.