Patent · US Active

Substrate and method of forming substrate for fluid ejection device

US7530661B2 · kind B2 · utility

1Cited by
9References
32Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 24, 2006
Grant dateMay 12, 2009
Priority date
Expiry dateJun 12, 2027

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41J2/1631
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A substrate for a fluid ejection device includes a first side, a second side opposite the first side, and a fluidic channel communicating with the first side and the second side. A first portion of the fluidic channel extends from the first side toward the second side, a second portion of the fluidic channel extends from the second side toward the first side, and a third portion of the fluidic channel extends from an interface between the first portion and the second portion of the fluidic channel toward the second side.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.