Method for eliminating punctual defects comprised in an electrochemical device
US7531101B2 · kind B2 · utility
158Cited by
2References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 1, 2003 |
| Grant date | May 12, 2009 |
| Priority date | — |
| Expiry date | Jul 1, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB32B17/1077
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of eliminating, using a beam of laser radiation, defects lying within a laminate formed from at least a first substrate and from at least a second substrate. The laminate incorporates, between the first and second substrates, at least one smart active system. The method locates at least one defect lying within the active system and ablates the defect, by circumscribing the defect using a laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.