Organometallic compounds
US7531458B2 · kind B2 · utility
2Cited by
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9Claims
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Key dates
| Filing date | Sep 29, 2006 |
| Grant date | May 12, 2009 |
| Priority date | — |
| Expiry date | Aug 3, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/18
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Organometallic compounds containing an electron donating group-substituted alkenyl ligand are provided. Such compounds are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.