Method and apparatus for electronic device manufacture using shadow masks
US7531470B2 · kind B2 · utility
2Cited by
6References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 27, 2005 |
| Grant date | May 12, 2009 |
| Priority date | — |
| Expiry date | Jul 31, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Electronic devices are formed on a substrate that is advanced stepwise through a plurality of deposition vessels. Each deposition vessel includes a source of deposition material and has at least two shadow masks associated therewith. Each of the two masks is alternately positioned within the corresponding deposition vessel for patterning the deposition material onto the substrate through apertures in the mask positioned therein, and positioned in an adjacent cleaning vessel for mask cleaning. The patterning onto the substrate and the cleaning of at least one of the masks are performed concurrently.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.