Plasma shunting apparatus and method for ring laser gyroscope
US7535575B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 5, 2007 |
| Grant date | May 19, 2009 |
| Priority date | — |
| Expiry date | Jan 3, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2222
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A ring laser gyroscope includes a first plasma shunt arranged to prevent the plasma from contacting a first mirror in the gain region and a second plasma shunt arranged to prevent the plasma from contacting a second mirror in the gain region. The first and second plasma shunts may comprise electrical conductors located in the respective mirror wells and arranged such that contact between the plasma and the electrical conductors quenches the plasma in the mirror wells and produces electrical currents that travels across the mirror wells. The electrical conductors may be formed as metallized strips arranged to extend across the mirror wells, or they may be formed from metal wires. The plasma shunts may alternatively comprise diversion passages formed in the frame and arranged such that the plasma fills the diversion passages and bypasses the mirrors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.