Method for sample preparation for exposing a main pole of a recording head
US7536775B2 · kind B2 · utility
1Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2005 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Mar 1, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53165
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for sample preparation. The method includes mechanically polishing portions of an insulating layer over a main pole of a recording head embedded within a sample structure. The insulating layer is polished top down in planar layers perpendicular to an air bearing surface adjoining the main pole. The method also includes selectively wet etching the remaining portions of the insulating layer to expose the main pole, wherein the insulating layer surrounds the main pole. Etching is made without damaging the main pole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.