Electron beam apparatus, and method for manufacturing a spacer used for the same
US7537503B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2006 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Sep 21, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.