Coating process to enable electrophoretic deposition
US7538045B2 · kind B2 · utility
3Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2006 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Feb 10, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D13/02
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.