Patent · US Active

Exposure process and apparatus using glass photomasks

US7538853B2 · kind B2 · utility

0Cited by

2References

2Claims

0Family size

Assignee

Fujitsu Hitachi Plasma Display Limited · JP

Inventors

Masashi Nishiki · Miyazaki, JP
Hisashi Okada · Yokohama, JP

Key dates

Filing date	Mar 21, 2006
Grant date	May 26, 2009
Priority date	—
Expiry date	Jul 21, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70466
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.