Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide

US7541070B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Nicolas Schiller · Helmsdorf, DE
• Steffen Straach · Dresden, DE
• Mathias Räbisch · Bad Schandau, DE
• Matthias Fahland · Dresden, DE
• Christoph Charton · Dresden, DE

Key dates

• Filing date: Oct 16, 2003
• Grant date: Jun 2, 2009
• Expiry date: Nov 19, 2023

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/081
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.