Patent · US Active

Automatic cleaning of ion sources

US7541597B2 · kind B2 · utility

4Cited by

5References

11Claims

0Family size

Assignee

Bruker Daltonik GmbH · DE

Inventors

Armin Holle · Oyten, DE
Gregor Przybyla · Bremen, DE

Key dates

Filing date	Nov 13, 2006
Grant date	Jun 2, 2009
Priority date	—
Expiry date	Jun 30, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32862
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to the automatic cleaning of ion sources inside mass spectrometers, especially the cleaning of ion sources where the ions are generated by matrix-assisted laser desorption (MALDI).The invention consists in cleaning the electrodes of the ion source, which are contaminated with organic material, in the mass spectrometer itself by etching with reactive ions produced by an electrically generated gas discharge in a specially admitted reactant gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.