Radiation-sensitive composition and elements with basic development enhancers
US7544462B2 · kind B2 · utility
12Cited by
9References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2007 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Feb 22, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/121
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Radiation-sensitive compositions can be used to prepare positive-working imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble polymeric binder that includes a phenolic resin (such as a novolak) or a poly(vinyl acetal). The compositions also include a developability-enhancing composition comprising one or more basic nitrogen-containing organic compounds. The radiation-sensitive composition can be coated as an imageable layer that further includes a radiation absorbing compound that is, for example, sensitive to infrared radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.