Method for manufacturing substrate of liquid crystal device
US7544528B2 · kind B2 · utility
17Cited by
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16Claims
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Key dates
| Filing date | May 8, 2007 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | May 8, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a substrate of a liquid crystal display device is disclosed. The method includes forming a conductive line structure with low resistance to improve the difficulty of the resistance matching. The method can effectively reduce the resistance of the conductive line of the LCD panel to increase the transmission rate of the driving signal. Hence, the increasing yield of products can reduce the cost of manufacturing, and can meet the requirement of the large-size and high-definition thin film transistor liquid crystal display device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.