Method for manufacturing display substrate
US7544581B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 29, 2008 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Feb 29, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133519
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a display substrate is disclosed, which includes the following steps: providing a substrate; forming a plurality of bumps on an active area of the substrate and at least one marking pattern on a non-active area of the substrate; and staining the marking pattern or filling a material having low transmittance ratio into the marking pattern. The present invention further discloses a method for making a display substrate, including the steps: providing a substrate; forming a shadow layer on a non-active area of the substrate; forming a plurality of bumps on an active area of the substrate and at least one marking pattern on the shadow layer of the non-active area on the substrate; and removing a part of the shadow layer not covered by the marking pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.