Displacement measurement system
US7545507B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2007 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Jul 3, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A displacement measurement apparatus includes a light source, a splitter grating, a measurement grating, and first a second detector arrays. The splitter grating splits a light beam into first and second measurement channels that each illuminates the measurement grating. The first and second measurement channels split into 0th and 1st order diffraction products at the measurement grating in a first pass and recombine at the measurement grating in a second pass before being measured at the first and second detector arrays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.