Organometallic compounds
US7547631B2 · kind B2 · utility
5Cited by
5References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 4, 2006 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Aug 3, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/40
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Organometallic compounds containing a phosphoamidinate ligand are provided. Such compounds are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.