Illumination energy management in surface inspection
US7548308B2 · kind B2 · utility
5Cited by
30References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 2005 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Sep 28, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8806
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and associated method for reducing thermal damage on a specimen during an inspection which includes a radiation source for supplying a beam of radiation, and a means for adjusting a first energy level of the beam of radiation to a second energy level as the beam of radiation is variably positioned from a first location on the surface of the wafer to a second location on the surface of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.