Offset amount measuring method and apparatus
US7548499B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2005 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Feb 1, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/0953
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An offset amount measuring method is provided with: a recording process for measurement (i) of recording information for measurement, into a recording track in the L0 layer, by a predetermined section, from a measurement reference position, and of (ii) recording the information for measurement, into a recording track in the L1 layer, by the predetermined section, from or toward a measurement correspondence position, which is associated with the measurement reference position by the pre-format address; a first detecting process of detecting a border of a first recorded area in which the information for measurement is recorded and a first unrecorded area in the first recording track, on the basis of a difference in reflectance between the first recorded area and the first unrecorded area; a second detecting process of detecting a second border position in the recording track in the L1 layer, on the basis of a difference in reflectance; and a determining process of determining the offset amount, on the basis of the detected first and second border positions. Moreover, it is also provided with a judging process of judging whether or not the determined offset amount is within tolerance …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.