Interspinous process distraction implant and method of implantation
US7549999B2 · kind B2 · utility
67Cited by
242References
20Claims
0Family size
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Key dates
| Filing date | Apr 1, 2004 |
| Grant date | Jun 23, 2009 |
| Priority date | — |
| Expiry date | Oct 11, 2025 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B17/7068
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An implant for positioning between the spinous processes, such as the spinous processes of cervical vertebrae, include first and second wings foe lateral positioning and a spacer located between the adjacent spinous processes. The implant can be positioned using minimally invasive procedures without modifying the bone or severing ligaments. The implant is shaped in accordance with the anatomy of the spine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.