Patent · US Active

Copolymers for stain resistance

US7550199B2 · kind B2 · utility

5Cited by
13References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 31, 2006
Grant dateJun 23, 2009
Priority date
Expiry dateJan 10, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T442/2279
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formulawherein

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.