Patent · US Active

Process for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and assembly

US7551375B2 · kind B2 · utility

0Cited by

5References

27Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Johannes Rau · Gerstetten, DE
Josef Distl · Oberkochen, DE
Armin Schoeppach · Aalen, DE
Hubert Holderer · Oberkochen, DE

Key dates

Filing date	Mar 21, 2006
Grant date	Jun 23, 2009
Priority date	—
Expiry date	Feb 8, 2027

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49144
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.