X-ray target and apparatuses using the same
US7551722B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2005 |
| Grant date | Jun 23, 2009 |
| Priority date | — |
| Expiry date | Oct 13, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/088
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are an X-ray target having a micro focus size and capable of producing X-rays of high intensity, and apparatuses using such an X-ray target. The X-ray target (1) has a structure in which a first cap layer (21), a target layer (22), and a second cap layer (23) are successively laminated, wherein the first and second cap layers (21 and 23) are each composed of a material which is lower in electron beam absorptivity than that of which the target layer (22) is composed. An X-ray generator using the X-ray target (1) can generate highly intense and nanofocus (several nm) X-rays (17). Using the X-ray generator, an X-ray microscope allows obtaining a high resolution transmission image, an X-ray diffraction apparatus allows obtaining an X-ray diffraction image of a very small area, and a fluorescent X-ray analysis apparatus allows making the fluorescent X-ray analysis of a minute area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.