Method for quickly quantifying the resistance of a thin film as a function of frequency
US7552018B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2007 |
| Grant date | Jun 23, 2009 |
| Priority date | — |
| Expiry date | Jul 12, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides a baseline function, viz., a transmission-related parameter (transmission loss, transmission coefficient, etc.) as a function of resistance of a uniformly resistant finitely thin film—which is predicated on the theoretical behavior of electromagnetic radiation passing through a uniformly resistant infinitely thin film. This theoretical behavior is characterized by constancy of the transmission-related parameter for any frequency of the electromagnetic radiation, wherein each resistance value has associated therewith a constant transmission-related parameter. The baseline function is formed by calculating the constant transmission-related parameter value for each of plural resistance values in the theoretical model. The baseline function is correlated with an empirical function, viz., a transmission-related parameter as a function of frequency of the electromagnetic radiation—which is formed, in empirical testing, by measuring the transmission-related parameter value for each of plural resistance values. The correlation yields a functional relationship between resistance and frequency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.