Patterned functionalized silicon surfaces
US7553776B2 · kind B2 · utility
1Cited by
10References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2006 |
| Grant date | Jun 30, 2009 |
| Priority date | — |
| Expiry date | Jan 28, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/857
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method for preparing a silicon substrate and a silicon substrate having a silicon surface comprising a pattern of covalently bound monolayers. Each of the monolayers comprises an alkyne, wherein at least a portion of each monolayer is no more than about 5 molecules of the alkyne wide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.