Plasma spectroscopy system with a gas supply
US7554660B2 · kind B2 · utility
1Cited by
0References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 2006 |
| Grant date | Jun 30, 2009 |
| Priority date | — |
| Expiry date | Sep 9, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A spectroscopy system for spectro-chemical analysis of a sample includes a plasma torch (50) for generating a microwave induced plasma (90) as a spectroscopic source. The plasma forming gas is nitrogen which can contain an oxygen impurity. Thus the system includes a nitrogen generator (70) which is preferably supplied with compressed atmospheric air from a compressor (75) for oxygen to be removed from the air by adsorption. The invention allows the use of an on-site nitrogen gas generator and thus gives cost savings because the need to obtain supplies of bottled high purity gas is eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.