Electron beam recording apparatus
US7554896B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2005 |
| Grant date | Jun 30, 2009 |
| Priority date | — |
| Expiry date | Apr 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/855
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An electron beam recording apparatus provided with control means for forming a latent image in a resist layer on a disk substrate corresponding to a predetermined pattern by controlling the irradiation position of an electron beam irradiation unit on the surface of the resist layer in accordance with the rotation angle of the disk substrate by a rotational drive unit, the shift position by a shift drive unit and the recording data that represent the predetermined pattern, and beam-adjusting means for irradiating an electron beam so as to spread over a plurality of tracks in the direction of traversing the tracks in response to the irradiation position control due to the control means, and an electron beam recording method using the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.