Detection and characterization of SiCOH-based dielectric materials during device fabrication
US7556972B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Jan 25, 2007 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | Mar 3, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/04
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Processes and apparatuses are disclosed for detecting and characterizing SiCOH-based dielectric materials during integrated circuit fabrication. The processes generally include chromatographically analyzing a fluid stream generated during a process employed for device fabrication, e.g., during a wet strip, a chemical mechanical planarization process and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.