Characterization of micromirror array devices using interferometers
US7557932B2 · kind B2 · utility
1Cited by
18References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 19, 2005 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | Jan 19, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0841
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.