Patent · US Expired

Characterization of micromirror array devices using interferometers

US7557932B2 · kind B2 · utility

1Cited by
18References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 19, 2005
Grant dateJul 7, 2009
Priority date
Expiry dateJan 19, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B26/0841
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.