Digital lithography using real time quality control
US7559619B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2005 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | Sep 9, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0198
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.