Patent · US Active

Sputtering target and method/apparatus for cooling the target

US7560011B2 · kind B2 · utility

0Cited by

8References

20Claims

0Family size

Assignee

Guardian Industries Corp. · US

Inventors

Hendryk Richert · Jena, DE
Uwe Kriltz · Bitterfeld-Wolfen, DE
Armin Schmidt · Zeulenroda, DE
Roland Weidl · Bollberg, DE
Gerald Janicke · Bitterfeld-Wolfen, DE

Key dates

Filing date	Oct 24, 2005
Grant date	Jul 14, 2009
Priority date	—
Expiry date	Jul 27, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3405
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A sputtering target includes an outer target tube, an inner support tube supporting a magnet carrier bar extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling plenum radially between the inner support tube and the outer target tube; and a baffle comprising a substantially flat plate attached to the inner support tube adjacent the opposite end, the plate extending radially within the plenum between the inner support tube and the outer target tube and having an array of flow apertures therein.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.