Extended-lifetime elements for excimer lasers
US7561611B2 · kind B2 · utility
1Cited by
11References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 3, 2005 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | May 2, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/08059
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention is directed to elements used in high power laser lithographic systems operating at below 250 nm, and in particular to elements that have a coating of selected materials to extend lifetime of the elements; and to a method of preparing the extended lifetime elements. The invention is particularly directed to gratings and mirrors that are coated with silicon dioxide, aluminum oxide or fluorinated silicon dioxide. The coatings of the invention attain their extended life as a result of being deposited while being simultaneously bombarded with an energetic ion plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.