Automated sputtering target production
US7561937B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2006 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | May 23, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T409/303864
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system and method are provided for manufacturing workpieces, such as metal articles like sputtering target, the system comprising: comparing one or more physical or chemical values of a respective one of a plurality of metal target blanks to one or more comparable values of at least one desired criterion; selecting one of the metal target blanks from a plurality of metal target blanks as a work-in-progress; assigning a serial route for the work-in-progress; processing the work-in-progress by translating the work-in-progress from note to node with an automated transport, after completion of the events at each node; rejecting or accepting the work-in-progress as a metal target by evaluating a result of at least one event of the one or more respective events to be completed at, at least one of the plurality of nodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.