Position measurement system
US7562821B2 · kind B2 · utility
2Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2006 |
| Grant date | Jul 21, 2009 |
| Priority date | — |
| Expiry date | Feb 24, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A position measurement system, includes: a plurality of concentric pattern projectors each for projecting a concentric pattern; an image sensor that has a sensor plane and that detects the concentric pattern; and an arithmetic unit that calculates a position of the image sensor and a normal direction of the sensor plane from a detection signal of the image sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.