Mask and method of fabricating the same, and method of machining material
US7563382B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 27, 2004 |
| Grant date | Jul 21, 2009 |
| Priority date | — |
| Expiry date | Dec 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0015
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method of fabricating a mask which can endure use for a long time and can be used for forming an isolated pattern with a high aspect ratio. The method includes the steps of: forming a soft material layer by disposing a soft material having positive photo sensitivity and adhesion or adhesiveness on a material as a target of machining; forming a hard material layer by disposing an opaque hard material in which a desired mask pattern has been formed in advance on the soft material layer; and forming the mask pattern in the soft material layer by performing exposure to light and development on the soft material layer by using the hard material layer as a photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.