Transparent conductive film and transparent conductive base material utilizing the same
US7563514B2 · kind B2 · utility
16Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2004 |
| Grant date | Jul 21, 2009 |
| Priority date | — |
| Expiry date | Jan 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13439
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The transparent conductive film 1 includes laminated transparent conductive thin films 10 and 20 of at least two layers. The transparent conductive thin film of the uppermost layer is an amorphous oxide thin film composed of gallium, indium, and oxygen, a gallium content ranges from 49.1 atom % to 65 atom % with respect to all metallic atoms, a work function is 5.1 eV or more, and a surface resistance is 100 Ω/□ or less. The transparent conductive base material includes a transparent substrate and the transparent conductive film 1 formed one or both surfaces of the transparent substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.