Apparatus, system, and method for determining a time-temperature history of an aftertreatment device
US7572054B2 · kind B2 · utility
0Cited by
2References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 19, 2007 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Feb 5, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/40
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus, system, and method are disclosed for determining a time-temperature history of an aftertreatment device. The apparatus includes an aftertreatment device comprising a substrate, and at least one thermal monitoring member (TMM) in thermal contact with the substrate. The TMMs may comprise a material that exhibits an electrical resistivity change at temperature over time. The apparatus may include a controller configured to measure the electrical resistivity of at least a portion of the TMMs, and to determine a thermal history based on the electrical resistivity measures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.