Vacuum pump
US7572096B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2005 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Dec 23, 2026 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2300/611
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A vacuum pump is provided in which gas molecules in a vacuum chamber are sucked and exhausted by the rotational motion of a rotor rotatably supported in a pump case. At least one nickel alloy layer is disposed on a surface of at least one component defining a flow path in the vacuum pump for increasing a resistance of the component to corrosion due to a corrosive effect of a gas flowing through the flowpath. A nickel oxide is formed on a surface of the nickel alloy layer and has a higher emissivity than that of the nickel alloy layer for increasing a quantity of heat radiated from the surface of the component when the component is heated during operation of the vacuum pump.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.