Patent · US Active

Polishing apparatus and pad replacing method thereof

US7572173B2 · kind B2 · utility

5Cited by
13References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 20, 2007
Grant dateAug 11, 2009
Priority date
Expiry dateAug 20, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T483/174
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing apparatus and a pad replacing method thereof are provided. The polishing apparatus includes a first clamping element, a second clamping element and a polishing head. The first clamping element includes a first upper clamper and a first lower clamper for clamping a first area of a first polishing pad. The second clamping element includes a second upper clamper and a second lower clamper for clamping a second area of the first polishing pad, the first area and the second area are opposite to each other. When the first polishing pad will be disconnected from the bottom surface of the polishing head and replaced by a second polishing pad, the first clamping element and the second clamping element are released from the first polishing pad.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.