Chemically amplified resist composition
US7572570B2 · kind B2 · utility
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3References
13Claims
0Family size
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Inventors
Key dates
| Filing date | Mar 20, 2008 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Mar 20, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a chemically amplified resist composition comprising: wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.