Filament support arrangement for substrate heating apparatus
US7573004B1 · kind B1 · utility
5Cited by
6References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 16, 2007 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Aug 31, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67103
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus for supporting the heater filament of the reactor in Chemical Vapor Deposition (CVD) system. The apparatus includes a recess or aperture disposed in a filament support plate; an electrically isolated rod supporting at least one of the coils of the filament, and extends into the recess or aperture in the support plate. A thermally insulating sleeve surrounds the rod. The post and sleeve arrangement provide a controlled and adjustable amount of lateral and vertical movement to the rod and filament to prevent damage to the filament caused by thermal expansion while providing lateral and vertical support to the filament.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.