Plasmon wave propagation devices and methods
US7573045B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2007 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Jan 7, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J25/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Nanoantennas are formed on a substrate (e.g., silicon) and generate light via interactions with a charged particle beam, where the frequency of the generated light is based in large part on the periodicity of the “fingers” that make up the nanoantennas. Each finger has typical dimensions of less than 100 nm on the shorter side and typically less than 500 nm on the longer, but the size of the optimal longer side is determined by the electron velocity. The charged particle may be an electron beam or any other source of charged particles. By utilizing fine-line lithography on the surface of the substrate, the nanoantennas can be formed without the need for complicated silicon devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.