Method for vapour deposition on an elongated substrate
US7574875B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2002 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Jan 16, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B37/01884
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Device and method for chemical deposition on an elongated member of vitreous material in which a rotating gripping member causes a first end portion of the elongated member to rotate. The second end portion of the elongated member is borne by a pair of supporting members which are axially spaced apart (L1) and are capable of permitting angular rotational movement and axial sliding of the second end portion. Each supporting member also applies a radial constraint preventing the second end portion from moving away from the axis of rotation, thus forcing the second portion and the elongated member to lie with a longitudinal axis coaxial with the axis of rotation. Any curvature of the elongated member is corrected and recovered in this way.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.