Film formation method and orientation film formation method
US7575774B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2008 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Jan 25, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13378
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a film formation method, a droplet discharge unit discharges droplets of a functional liquid material on a substrate as the droplet discharge unit is moved with respect to the substrate to form a liquid film on the substrate. The film formation method includes discharging a plurality of first droplets onto a plurality of first positions on the substrate with the first positions being arranged so that the first droplets do not touch each other on the substrate, discharging a plurality of second droplets onto a plurality of second positions on the substrate with the second positions being disposed between the first droplets that were discharged on the substrate; and causing the second droplets to touch a plurality of adjacent ones of the first droplets to form the liquid film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.