Structure for pattern formation, method for pattern formation, and application thereof
US7575845B2 · kind B2 · utility
9Cited by
11References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2001 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Jun 15, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.